دانلود گزارش کارورزی و کار آموزی

چکیده : 

The crystallographic properties of tantalum films deposited as a bioactive coating on Co–Cr–Mo and

Ti–Al–Nb alloys have been investigated. The desired tough and ductile alpha phase of tantalum has

been obtained by DC magnetron sputtering on Co–Cr–Mo and Ti–Al–Nb substrates. The thickness of the

tantalum layer was between 20 and 600 nm. The crystallographic structure of tantalum thin film was

dependent on the sputtering parameters such as DC power, bias voltage and gas impurities. Oxygen

is an important factor for the stabilization of the tantalum alpha phase on Co–Cr–Mo substrate. The

crystallographic structure and texture of tantalum thin films was found to be additionally dependent on

the substrate composition. For Ti–Al–Nb substrate, oxygen content was not an important factor for the

stabilization of the alpha phase. The observed shift of X-ray diffraction peaks to lower 2() is an indication

of stress evolving during the sputtering process and was dependent on bias voltage and oxygen content

of the carrier gas.